ASML HOLDING NV FORM 6-K. (Report of Foreign Issuer) Filed 04/04/14 for the Period Ending 04/04/14

Transcription

1 ASML HOLDING NV FORM 6-K (Report of Foreign Issuer) Filed 04/04/14 for the Period Ending 04/04/14 Telephone CIK Symbol ASML SIC Code Special Industry Machinery, Not Elsewhere Classified Industry Semiconductor Equipment & Testing Sector Technology Fiscal Year 12/31 Copyright 2017, EDGAR Online, a division of Donnelley Financial Solutions. All Rights Reserved. Distribution and use of this document restricted under EDGAR Online, a division of Donnelley Financial Solutions, Terms of Use.

2 SECURITIES AND EXCHANGE COMMISSION Washington, D.C FORM 6-K REPORT OF A FOREIGN ISSUER PURSUANT TO RULE 13A-16 OR 15D-16 OF THE SECURITIES EXCHANGE ACT OF 1934 For April 4, 2014 ASML Holding N.V. De Run DR Veldhoven The Netherlands (Address of principal executive offices) Indicate by check mark whether the registrant files or will file annual reports under cover of Form 20-F or Form 40-F. Form 20-F Form 40-F Indicate by check mark whether the registrant by furnishing the information contained in this Form is also thereby furnishing the information to the Commission pursuant to Rule 12g3-2(b) under the Securities Exchange Act of Yes No If Yes is marked, indicate below the file number assigned to the registrant in connection with Rule 12g3-2(b):

3 Exhibits 99.1 Annual General Meeting of Shareholders Registration, attendance and voting procedures 99.2 Annual General Meeting of Shareholder 2014 Agenda 99.3 Annual General Meeting of Shareholders 2014 Authorization and Voting Instruction Form 99.4 Marked up version of the Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) 99.5 EUV lithography NXE platform performance overview, presentation dated February 23-27, Extending ArFi immersion scanner capability in support of 1xnm production nodes, presentation dated February 27, Update on share buy-back program 2

4 SIGNATURES Pursuant to the requirements of the Securities Exchange Act of 1934, the registrant has duly caused this report to be signed on its behalf by the undersigned, thereunto duly authorized. ASML HOLDING N.V. (Registrant) Date: April 4, 2014 By: /s/ Peter T.F.M. Wennink Peter T.F.M. Wennink Chief Executive Officer 3

5 Exhibit 99.1 Annual General Meeting of Shareholders 2014 Registration, attendance and voting procedures Registration, attendance and voting procedures for the Annual General Meeting of Shareholders of ASML Holding N.V. (the Company ) to be held on Wednesday, April 23, 2014, starting at 2.00 pm CET at the Auditorium, ASML Building 7, De Run 6665, Veldhoven, the Netherlands (the Meeting ). Holders of shares listed on Euronext Amsterdam by NYSE Euronext ( Euronext Amsterdam ) For holders of shares listed on Euronext Amsterdam the Board of Management has designated as register or sub-register the records of the affiliated institutions and intermediaries of Euroclear Nederland. Holders of shares listed on Euronext Amsterdam who wish to attend the Meeting either in person or by proxy must notify ABN AMRO Bank N.V. ( ABN AMRO ), through their bank or broker, that they wish to attend the Meeting. Shareholders may also register for the Meeting via evoting. Registration requests may be submitted in the period starting Thursday, March 27, 2014 until and including Wednesday, April 16, 2014, 5.30 pm CET. No later than Thursday, April 17, 2014, 5.30 pm CET the intermediaries must provide ABN AMRO with a statement containing the number of shares held by the respective shareholders on March 26, 2014 ( the Registration Date ) and for which number of shares registration for the Meeting is requested. At the moment of registration the intermediaries are requested to state the complete address details in order to efficiently verify shareholding. Admission to the Meeting Shareholders will subsequently receive a confirmation of registration, including registration number, by or regular mail. The registration number will give shareholders entrance to the Meeting. Shareholders or their proxies who do not receive the registration number in time, will be requested to identify themselves by means of a valid identification document prior to the Meeting. Online voting / voting by proxy Shareholders who do not wish to attend the Meeting in person may grant a proxy to Notary Mr R.C.J. van Helden (or his substitute), and instruct him to vote at the Meeting on the shareholders behalf. In order to vote by proxy, shareholders must have registered their shares as described above. Shareholders can submit their voting instructions online via until and including Wednesday, April 16, Shareholders who are unable to submit voting instructions to Notary Mr R.C.J. van Helden (or his substitute) through the internet may use a voting instruction form which can be downloaded below or which can be obtained upon request at ABN AMRO, telephone +31(0) or corporate.broking@nl.abnamro.com. In order to vote by proxy shareholders must have registered their shares as described above. The voting instruction form also provides the opportunity to designate another person as proxy. After completion and signing the voting instruction form should be sent to ABN AMRO Bank N.V., Corporate Broking, HQ 7050, Gustav Mahlerlaan 10, 1082 PP Amsterdam, the Netherlands, where it should be received no later than Wednesday, April 16, Voting Instruction Form Voting Instruction Form Download PDF Holders of shares traded on Nasdaq Stock Market LLC For holders of shares traded on Nasdaq Stock Market LLC ( NY Shareholders ) the Board of Management has designated as register the Shareholders Register kept at New York. NY Shareholders who wish to attend the Meeting must notify JP Morgan Chase Bank, N.A. ( JP Morgan ), P.O. Box 64506, St. Paul, MN , U.S.A - directly or through their bank or broker. - no later than Wednesday, April 16, 2014, pm EST. Page 1 of 2

6 NY Shareholders who do not wish to attend the Meeting in person may vote by means of a proxy card. The proxy card should be received by JP Morgan at the address mentioned above no later than Wednesday, April 16, 2014, pm EST. JP Morgan will forward the proxy card to the Company on the NY Shareholders behalf; in case the name of the proxy is left blank, the Company shall designate the Deputy Company Secretary to act as proxy for such shareholders and to vote on their behalf. Proxy cards will be sent to the NY Shareholders and are also available on request at the above office of JPMorgan Chase Bank, P.O. Box 64506, St. Paul, MN , U.S.A., jpmorgan.adr@wellsfargo.com, telephone (from the US) or (from outside the US). Holders of shares registered in the Shareholders Register kept at Veldhoven Shareholders who are registered in the Shareholders Register kept at Veldhoven and who wish to attend the Meeting either in person or by proxy can for the Meeting in the period starting Thursday, March 27, 2014 until and including Wednesday, April 16, 2014, 5.30 pm CET, through ASML Holding N.V., Corporate Legal Department, De Run 6501, 5504 DR Veldhoven, the Netherlands, legal@asml.com. Shareholders who do not wish to attend the Meeting in person may grant a proxy to Notary Mr R.C.J. van Helden (or his substitute), and instruct him to vote at the Meeting on the shareholders behalf by means of a voting instruction form which can be downloaded below or which can be obtained upon request at the Company ( legal@asml.com or telephone (+31)(0) ). In order to vote by proxy shareholders must register their shares as described above. The voting form also provides the opportunity to designate another person as proxy. After completion and signing the voting instruction form should be sent to the proxy. In case of Notary Mr R.C.J. van Helden (or his substitute) the voting instruction form should be sent to: Notary Mr R.C.J. van Helden, Keizersgracht , 1017 DW Amsterdam, where it should be received no later than Wednesday, April 16, Voting Instruction Form Voting Instruction Form Download PDF Page 2 of 2 Copyright 2012 (ASML) All rights reserved ASML.com > Investors > Shareholders > AGM 2014 > Voting and Registration Procedures

7 Exhibit 99.2 AGENDA for the Annual General Meeting of Shareholders of ASML Holding N.V. (the Company ), to be held at the Auditorium, ASML Building 7, De Run 6665, Veldhoven, on Wednesday, April 23, 2014, beginning at hours (CET). 1. Opening. 2. Overview of the Company s business, financial situation and sustainability. (Discussion item) 3. Discussion of the execution of the Remuneration Policy (version 2010) for the Board of Management over the financial year (Discussion item) 4. Discussion of the 2013 Annual Report, including ASML s corporate governance chapter, and proposal to adopt the financial statements for the financial year 2013, as prepared in accordance with Dutch law. (Voting item) 5. Proposal to discharge the members of the Board of Management from liability for their responsibilities in the financial year (Voting item) 6. Proposal to discharge the members of the Supervisory Board from liability for their responsibilities in the financial year (Voting item) 7. Clarification of the Company s reserves and dividend policy. (Discussion item) 8. Proposal to adopt a dividend of EUR 0.61 per ordinary share of EUR (Voting item) 9. Proposal to adopt some adjustments to the Remuneration Policy (version 2014) for the Board of Management (the Remuneration Policy ). (Voting item) 10. Proposal to approve the number of performance shares for the Board of Management, to be determined by the calculation method as described in the Remuneration Policy, and authorization of the Board of Management to issue the performance shares for the financial year 2015, subject to approval of the Supervisory Board. (Voting item) 11. Proposal to approve the number of stock options, respectively shares, for employees. (Voting item) 12. Composition of the Board of Management. (Discussion item) Notification of the intended reappointments of Messrs. P.T.F.M. Wennink and M.A. van den Brink; Notification of the intended reappointment of Mr. F.J.M. Schneider-Maunoury; Notification of the intended appointment of Mr. W.U. Nickl. Agenda AGM

8 13. Composition of the Supervisory Board. (Two voting items) Nomination by the Supervisory Board of the following persons for (re)appointment as member of the Supervisory Board, effective April 23, 2014: Mr. F.W. Fröhlich (reappointment); Mr. J.M.C. Stork (appointment). 14. Composition of the Supervisory Board in (Discussion item) Notification that Ms. H.C.J. van den Burg will retire by rotation in 2015; Notification that Mr. F.W. Fröhlich will retire by rotation in Proposal to adjust the remuneration of the Supervisory Board. (Voting item) 16. Proposal to reappoint the External Auditor for the reporting year (Voting item) 17. Proposals to authorize the Board of Management to issue shares or rights to subscribe for shares in the capital of the Company within the limits set forth in the Articles of Association of the Company, as well as to restrict or exclude the pre-emption rights accruing to shareholders. a. Proposal to authorize the Board of Management for a period of 18 months from April 23, 2014, to issue shares or rights to subscribe for shares in the capital of the Company, subject to approval of the Supervisory Board, limited to 5% of the issued share capital at the time of the authorization. (Voting item) b. Proposal to authorize the Board of Management for a period of 18 months from April 23, 2014, to restrict or exclude the pre-emption rights accruing to shareholders in connection with the issue of shares or rights to subscribe for shares as described under a., subject to approval of the Supervisory Board. (Voting item) c. Proposal to authorize the Board of Management for a period of 18 months from April 23, 2014, to issue shares or rights to subscribe for shares in the capital of the Company, subject to approval of the Supervisory Board, for an additional 5% of the issued share capital at the time of the authorization, which 5% can only be used in connection with or on the occasion of mergers, acquisitions and / or (strategic) alliances. (Voting item) d. Proposal to authorize the Board of Management for a period of 18 months from April 23, 2014, to restrict or exclude the pre-emption rights accruing to shareholders in connection with the issue of shares or rights to subscribe for shares as described under c., subject to approval of the Supervisory Board. (Voting item) Agenda AGM

9 18. Proposals to authorize the Board of Management to acquire ordinary shares in the Company s share capital. a. Proposal to authorize the Board of Management for a period of 18 months from April 23, 2014, to acquire - subject to the approval of the Supervisory Board - ordinary shares in the Company s share capital up to 10% of the issued share capital at the date of authorization (April 23, 2014), for valuable consideration, on Euronext Amsterdam by NYSE Euronext ( Euronext Amsterdam ) or the Nasdaq Stock Market LLC ( Nasdaq ), or otherwise, at a price between, on the one hand, an amount equal to the nominal value of the shares and, on the other hand, an amount equal to 110% of the market price of these shares on Euronext Amsterdam or Nasdaq; the market price being the average of the highest price on each of the five days of trading prior to the date of acquisition, as shown in the Official Price List of Euronext Amsterdam or as reported on Nasdaq. (Voting item) b. Proposal to authorize the Board of Management for a period of 18 months from April 23, 2014, to acquire -subject to the approval of the Supervisory Board - additional ordinary shares in the Company s share capital up to 10% of the issued share capital at the date of authorization (April 23, 2014), for valuable consideration, on Euronext Amsterdam or Nasdaq, or otherwise, at a price between, on the one hand, an amount equal to the nominal value of the shares and, on the other hand, an amount equal to 110% of the market price of these shares on Euronext Amsterdam or Nasdaq; the market price being the average of the highest price on each of the five days of trading prior to the date of acquisition, as shown in the Official Price List of Euronext Amsterdam or as reported on Nasdaq. Conditions to the additional authorization are that: (i) (ii) all shares acquired by the Company following the authorization under a. and not being held as treasury shares for the purpose of covering outstanding employee share and stock option plans, have been cancelled or will be cancelled, pursuant to item 19; and the number of ordinary shares which the Company may at any time hold in its own capital will not exceed 10% of the issued share capital at the date of authorization (April 23, 2014). (Voting item) 19. Proposal to cancel ordinary shares. (Voting item) Proposal to cancel ordinary shares in the share capital of the Company repurchased or to be repurchased by the Company. The number of ordinary shares that will be cancelled shall be determined by the Board of Management, but shall not exceed 20% of the issued share capital of the Company at April 23, Any other business. 21. Closing. Agenda AGM

10 Exhibit 99.3 Authorization and Voting Instruction Form For the Annual General Meeting of Shareholders of ASML Holding N.V. ( the Company or ASML ), to be held at the Auditorium, ASML Building 7, De Run 6665, Veldhoven, on April 23, 2014, beginning at 2.00 PM CET (the Meeting ). The undersigned hereby authorizes and appoints: Mr R.J.C. van Helden (or his substitute), Notary, Keizersgracht , 1017 DW Amsterdam, the Netherlands, or: The proxy will be asked to identify him/herself at the meeting. ( name of own proxy ), ID no.:, to represent and vote on his or her behalf at the Meeting per the voting instructions as indicated in this Authorization and Voting Instruction Form. Abbreviated agenda For Against Abstain 1. Opening. 2. Overview of the Company s business, financial situation and sustainability. 3. Discussion of the execution of the Remuneration Policy (version 2010) for the Board of Management over the financial year Discussion of the 2013 Annual Report, incl. ASML s corporate governance chapter, and proposal to adopt the financial statements for the financial year ( FY ) 2013, as prepared in accordance with Dutch law. 5. Proposal to discharge the members of the Board of Management from liability for their responsibilities in the FY Proposal to discharge the members of the Supervisory Board from liability for their responsibilities in the FY Clarification of the Company s reserves and dividend policy. 8. Proposal to adopt a dividend of EUR 0.61 per ordinary share of EUR Proposal to adopt some adjustments to the Remuneration Policy (version 2014) for the Board of Management (the Remuneration Policy ). 10. Proposal to approve the number of performance shares for the Board of Management, to be determined by the calculation method as described in the Remuneration Policy, and authorization of the Board of Management to issue the performance shares for the financial year 2015, subject to approval of the Supervisory Board. 11. Proposal to approve the number of stock options, respectively shares, for employees and authorization of the Board of Management to issue the stock options, respectively shares. 12. Composition of the Board of Management 13a. Proposal to reappoint Mr. F.W. Fröhlich as member of the Supervisory Board, effective April 23, b. Proposal to appoint Mr. J.M.C. Stork as member of the Supervisory Board, effective April 23, Composition of the Supervisory Board in Proposal to adjust the remuneration of the Supervisory Board. 16. Proposal to reappoint the External Auditor for the reporting year a. Proposal to authorize the Board of Management to issue (rights to subscribe for) shares, which authorization is limited to 5% of the issued capital. 17b. Proposal to authorize the Board of Management to restrict or exclude the pre-emption rights accruing to shareholders in connection with agenda item 17a. 17c. Proposal to authorize the Board of Management to issue (rights to subscribe for) shares, for an additional 5% of the issued capital, only to be used in connection with mergers, acquisitions and/or (strategic) alliances. 17d. Proposal to authorize the Board of Management to restrict or exclude the pre-emption rights accruing to shareholders in

11 connection with agenda item 17c. 18a. Proposal to authorize the Board of Management to acquire shares in the Company s capital. 18b. Proposal to authorize the Board of Management to acquire additional shares in the Company s capital, under the condition that the shares acquired under item 18a. have been cancelled and the number of shares held by the Company shall not exceed 10% of the issued share capital. 19. Proposal to cancel ordinary shares. 20. Any other business. 21. Closing To the granting of the authorization the terms as set forth below apply. The voting instructions above shall equally apply in the event the agenda of the Meeting is amended before or during the Meeting provided that such amendment of the agenda does not (materially) alter the contents of the items proposed to the general meeting of shareholders. Terms applicable to the granting of a proxy by way of this Authorization and Voting Instruction Form ( Terms ). Registration - Only the person who has registered for the Meeting as per the applicable procedure ( Shareholder ) can grant a proxy by way of this form. Voting instructions - The person who will vote on behalf of the Shareholder ( Authorized Person ) shall not be liable for any damage suffered by the Shareholder as a result of any action or lack of action by the Authorized Person when making use of, or otherwise in connection with, this Authorization and Voting Instruction Form ( Form ). The preceding sentence shall not apply to the extent that the damage is caused by willful misconduct or gross negligence on the part of the Authorized Person. The Shareholder shall indemnify the Authorized Person against any claim made by any third party in connection with this Form or in connection with acts performed by the Authorized Person in the Shareholder s name under this Form. The indemnity shall also relate to any damage or costs incurred by the Authorized Person in connection with such claim.

12 After completion of the Form by the Shareholder, ASML and the Authorized Person are not liable for incorrect voting instructions. By signing the Form, the Shareholder represents and warrants that he holds his shares in the capital of ASML fully and unencumbered, and that there is no pledgee or holder of a right of usufruct that may exercise the voting rights attached to these shares pursuant to a legal provision or a provision of the articles of association of ASML. In performing acts pursuant to this Form, the Authorized Person may act pursuant to a power of attorney granted by one or more other shareholders in the capital of ASML. The Authorized Person may grant a power of attorney to another person to vote, directly or indirectly, in the Shareholder s name within the limits of this Form, and he may substitute another person for himself as authorized person. If the first sentence applies, the other person shall (also) be the Authorized Person for the purposes of this Form. The voting instructions above shall equally apply in the event the agenda of the Meeting is amended before or during the Meeting provided that such amendment of the agenda does not (materially) alter the contents of the items proposed to the general meeting of shareholders. Invalidity - If these Terms are or become partially void, the parties will continue to be bound by the remainder of the same. The parties shall replace the void part by provisions that are valid and have legal effect that correspond with those of the void part as much as possible, taking into account the content and the purport of these Terms. Applicable Law and Jurisdiction - These Terms shall be exclusively governed by Dutch law. All disputes arising in connection with these Terms, including disputes concerning the existence and validity thereof, shall be resolved by the competent courts of Amsterdam, the Netherlands. By: Name City Date Number of shares registered Registration number (if known) Authorization and Voting Instruction Form AGM ASML Holding N.V

13 Exhibit 99.4 MARKED UP VERSION OF THE REMUNERATION POLICY REMUNERATION POLICY FOR THE BOARD OF MANAGEMENT OF ASML HOLDING N.V. (VERSION 2014) Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014)

14 MARKED UP VERSION OF THE REMUNERATION POLICY Remuneration Policy 2014 This remuneration policy applies as from 2014 onwards. The remuneration policy was approved by the Supervisory Board of ASML Holding N.V. ( ASML or the Company ), upon recommendation of its Remuneration Committee, subject to adoption of the Annual General Meeting of Shareholders on 24 April The policy is built on the following principles: Transparent the policy and its execution are clear and practical Alignment the remuneration policy is aligned with the policy for ASML senior management and other ASML employees Long-term the incentives focus on long-term value creation Compliant ASML adopts the highest standards of good corporate governance Simple the policy and its execution are as simple as possible and easily understandable to all stakeholders Reference group and market positioning The selection of companies for the reference group is driven by criteria of comparability in terms of size and complexity, data transparency and geographical area. For as long as ASML qualifies within the group of companies of more or less the same size, the median market level may serve as a reference in determining the level of pay for the Board of Management. In principle, the benchmark is conducted every two years. In the year without a market assessment, the Supervisory Board considers the appropriateness of any change of base salary on the market environment as well as the salary adjustments for other ASML employees. To ensure an appropriate composition of the relevant labor market, the Supervisory Board reviews the composition of the reference group in conjunction with the frequency of the benchmark. Substantial changes applied to the composition of the reference group will be proposed to the shareholders. The reference group consists of the following companies: Reference Group composition Ahold* Akzo Nobel* ASMI DSM Electrolux* Fugro* Gemalto Heineken* Imtech Infineon Technologies KPN Philips* Randstad Rolls Royce* Sandvik* SBM offshore* Unilever* * indicates a new reference company as compared to the Remuneration Policy 2010 Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) page 2 of 9

15 MARKED UP VERSION OF THE REMUNERATION POLICY Total Direct Compensation The remuneration levels are determined using the Total Direct Compensation (TDC). TDC consists of base salary, a short term incentive (STI) and a long term incentive (LTI). Each component and corresponding performance measures are described in this chapter. Other remuneration elements are pension and expense reimbursements. The latter may include company car costs, travel expenses, representation allowances, housing costs (gross amount before taxes), social security costs, health and disability insurance costs. The pay mix for the Board of Management (including CEO) is as follows: The pay mix (on-target) Base salary 43.5 % Short Term Incentive (STI) 26.1 % Long Term Incentive (LTI) 30.4 % Total Direct Compensation (TDC) % Base salary The policy prescribes a benchmark that will only be conducted for the Total Direct Compensation level. The base salary of Board of Management members is derived from this level. Variable Income (STI+LTI) The performance parameters are set by the Supervisory Board and consist of financial and qualitative measures. The Supervisory Board may adjust the performance measures and their relative weighting of the variable income based on the rules and principles as outlined in this policy, if required by changed strategic priorities in any given year. The Supervisory Board assesses the extent to which performance standards are met at the end of a performance period. Variable compensation (on-target) Short Term Incentive (STI) 60% Long Term Incentive (LTI) 70% Total Variable Compensation as % of base salary 130% In order to comply with the highest standards of Corporate Governance the appropriate claw-back and change in control provisions are applicable to the employment contracts of all members of the Board of Management. The Supervisory Board has the discretionary power to adjust the incentive pay-out up- or downward if it feels that the outcome is unreasonable due to exceptional circumstances during the performance period ( ultimum remedium ). Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) page 3 of 9

16 MARKED UP VERSION OF THE REMUNERATION POLICY Scenario analyses of the possible outcomes of the variable remuneration components and their effect on the remuneration of the Board of Management are conducted once every two years. Short Term Incentive The Short Term Incentive refers to the annual performance related cash incentive that is applicable to all members of the Board of Management. The target level of the Short Term Incentive is set at 60% of base salary. In case of excellent performance the maximum opportunity amounts to 90% of base salary. In order to achieve alignment in the remuneration structure of the Board of Management and other ASML employees, the policy includes a modifier on the STI payout that is connected to the profit sharing program for employees. In applying the modifier, the Supervisory Board will take into account the pay-out under the profit sharing scheme for all ASML employees. The modifier enables the Supervisory Board to discretionary adjust the STI pay-out of the Board of Management upward with 10% or downward with 20% of base salary. For the short term incentive the following criteria are set: Performance Measure Weight Financial 1. Direct Material Margin 20% 2. Company Cost Base 20% 3. Operating Cash Flow 20% Qualitative 4. Technology Index 20% 5. Market 20% Total 100 % The performance measures form a balanced mix of financial (60%) and qualitative measures (40%), the latter including one measure based on technology objectives and one measure based on the quality of our service to customers. The weighting is equally set for all five performance measures (20%). For each of the performance criteria the Supervisory Board sets challenging, but realistic target levels. The target setting and performance review occur on an annual basis, except for Direct Material Margin and Company Cost Base, which are set semi-annually. All performance measures are set in advance and will not change during the performance period. The pay-out levels are prorated upon the level of achievement of the five aforementioned performance criteria. Below threshold performance, there is no pay-out. Meeting threshold performance will result in a pay-out of 50% of target pay-out. In case of excellent performance, the maximum pay-out is capped at 150% of the target pay-out. The STI is paid on an annual basis. Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) page 4 of 9

17 MARKED UP VERSION OF THE REMUNERATION POLICY Long Term Incentive The Long Term Incentive refers to the share based incentive. All members of the Board of Management are eligible to receive performance related shares. The target level of the Long Term Incentive is set at 70% of base salary. In case of excellent performance the maximum opportunity amounts to 140% of base salary. The performance shares are conditionally granted on an annual basis to the members of the Board of Management. The shares will become unconditional depending on the achievement of predetermined performance targets during a three year period. Each performance cycle starts on the first day of the year of grant. The number of performance shares to be conditionally awarded is calculated at the beginning of this period using the volume-weighted average share price during the last quarter of the year preceding the conditional award. Performance measures Two types of performance measures relate to the Long Term Incentive: ASML s relative Return on Average Invested Capital (ROAIC) position compared to the performance peer group Long-term strategic qualitative targets to ensure ASML s ability to keep performing at high standards. Depending on the strategic requirements the definition and relative weight may change upon the discretion of the Supervisory Board Technology Leadership Index Sustainability The definition of the ROAIC target and calculation is as follows; ASML s cash rate of return on capital it has put to work, regardless of the capital structure of the company. It is used as a fundamental metric to measure value creation of the company. The ROAIC is calculated by dividing the Net Operating Profit (NOP) by the Average Invested Capital (AIC) The aforementioned performance measures receive the following weights; LTI performance measures ROAIC 80% Technology Leadership Index 15% Sustainability 5 % Total 100% The ROAIC of ASML is compared to a peer group consisting of a number of globally active companies in primarily the semiconductor industry, complemented by companies with a high capital base, high R&D investments and a long-term investment horizon. These companies have been verified to show similar trend lines as ASML and compete for shareholder preference. Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) page 5 of 9

18 MARKED UP VERSION OF THE REMUNERATION POLICY ROAIC performance peer group composition Advanced Energy Applied Materials ASM International Cymer Teradyne 1 KLA-Tencor Lam Research MKS Instruments Caterpillar Joy Global Rockwell Collins The peer group will be reviewed by the Supervisory Board on an annual basis to ensure the appropriateness of its composition before each conditional grant. The Supervisory Board may adjust the peer group based on market circumstances (mergers, acquisitions, or other corporate activities significantly affecting their comparability with ASML). If a peer company is not available for the full three-year performance period, it will be replaced for this full three year performance period by a substitute company. These substitute companies have been identified in advance of each performance cycle and an objective model has been developed that determines which substitute replaces the peer company that will no longer qualify. Performance incentive zone The vesting of performance shares depends on the relative ROAIC position as compared to the aforementioned peer group and the evaluation of the qualitative targets by the Supervisory Board. The vesting will be calculated at the end of the three year performance period for all performance measures, based on a predefined pay-out matrix. ROAIC vesting scheme Rank Pay-out as a % of target Pay-out as % of base salary 1 200% 112% 2 175% 98% 3 150% 84% 4 125% 70% 5 100% 56% 6 75% 42% 7 50% 28% 8 0% 0% 9 0% 0% 10 0% 0% 11 0% 0% For the Technology Leadership Index and Sustainability targets, the same threshold and maximum levels apply. The Supervisory Board, in cooperation with the relevant subcommittees (Technology and Strategy Committee, Audit Committee and Remuneration Committee) will assess the performance achieved against the qualitative targets. Both the STI and LTI make use of the Technology Leadership 1 Adjusted by the Supervisory Board in accordance with the Remuneration Policy. Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) page 6 of 9

19 MARKED UP VERSION OF THE REMUNERATION POLICY Index as a qualitative performance measure. The objective is equal, but the applicable measures, targets and performance periods are different and aligned with specific short and long term strategic priorities. The intention is to increase the weight of these new performance elements over time while reducing the ROAIC component. Grant date Performance shares will be granted at the start of a performance period (January 1 of the first performance year). Performance shares will be granted two days after the publication of ASML s annual results, in January of the year in which the three year performance period starts. Holding period The minimum holding period is two years after the vesting date or until termination of the employment contract, whichever period is shorter. The total holding period will be five years. In case a tax payment is due by the members of the Board of Management over the retrieved variable income, performance shares may be partially sold within the holding period of five years ( sell to cover ). Share ownership guidelines Members of the Board of Management are required to hold at least two times base salary in the form of shares. This ensures an alignment of the interests of members of the Board of Management with long term shareholder value throughout their employment by the company. The Remuneration Committee of the Supervisory Board will (i) after each financial year, determine the value of ASML shares then held by the individual members of the Board of Management, based on the shareholding data of the members of the Board of Management (to be) published in the annual report over that year, (ii) include vested ASML shares that are still in the holding period when determining the value of the ASML shares held by the individual members of the Board of Management, (iii) not define penalties upfront should the value of ASML shares held by a member of the Board of Management be lower than agreed, but determine potential penalties by using its discretionary judgment, thereby taking into consideration all relevant circumstances, and (iv) allow new members of the Board of Management time to meet the share ownership requirements (1-3 years, depending on the actual situation). Other remuneration Benefits The pension arrangement for the Board of Management is based on the excedent arrangement for ASML employees in the Netherlands. The plan is a defined contribution opportunity as defined in Dutch fiscal regulations. The total defined Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) page 7 of 9

20 MARKED UP VERSION OF THE REMUNERATION POLICY contribution is a percentage of the pensionable salary, which is equal to the base salary minus the Witteveen threshold 2, and depends on the participants age at the beginning of the year. The total net contribution is according to the maximum level as allowed by Dutch fiscal legislation, of which the participant contributes 4% of his pension base. Dependents pension and disability pension are insured on a risk basis, the premium of which is paid by ASML. As a guiding principle, the value of the pension arrangement is set at the median of executive pensions in the Netherlands using a general industry sample of companies. Appointments, E e mployment contracts and management services agreements Members of the Board of Management appointed after the 2004 amendment of the Articles of Association, are appointed for a period of four years, after which reappointment is possible for consecutive four-year terms. Members of the Board of Management appointed before 2004 are appointed for an indefinite period of time. Existing employment contracts, including all rights and obligations, will be honored. Severance agreements payment All E e mployment agreements respectively management services agreements for with members of the Board of Management appointed after March 31, 2004 do contain specific provisions regarding benefits upon termination of those agreements. If the Company gives notice of termination of the employment agreement for reasons which are not exclusively or mainly found in acts or omissions on the side of the Board of Management member, a severance amount equal to one year base salary will be made available upon the effective date of termination. This severance payment will also be made available in case the Board of Management member gives notice of termination of the employment agreement due to a substantial difference of opinion between the respective executives and the Supervisory Board regarding his employment agreement, his function or the ASML strategy. Employment agreements with the Board of Management members concluded prior to March 31, 2004 do not contain specific provisions regarding benefits upon termination of those agreements. Potential severance payments in such case will be according to the applicable law. 2 Dutch pension arrangements have a threshold in the buildup of pension entitlements. This threshold exists because all participants are assumed to be entitled to the Dutch state pension (AOW) and therefore do not need an additional pension over the first part of their pensionable income. The minimum level in the fiscal legislation for this threshold is related to the AOW allowance and is known as the Witteveen-threshold. This threshold is calculated as the annual AOW allowance (including holiday allowance) for a married person times 10/7. The Witteveen-threshold for 2013 is Euro13, Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) page 8 of 9

21 MARKED UP VERSION OF THE REMUNERATION POLICY Change in control Board of Management members with an employment agreement dated after March 31, 2004 are also entitled to the aforementioned severance payment in the event ASML or its legal successor gives notice of termination due to a change in control or if the Board of Management gives notice of termination, which is directly related to such change of control and such notice is given within twelve months from the date on which the change of control occurs. The Change of Control provision includes a mitigation of the pay-out under the LTI. This entails that the share price will be fixed on the average of i) the average closing share price over a period of 15 trading days prior to the first public announcement of change in control negotiations and ii) the average share price over a period of 30 trading days prior to the closing of the transaction. Loans ASML does not grant any loans or guarantees to any of the members of the Board of Management. Remuneration Policy for the Board of Management of ASML Holding N.V. (version 2014) page 9 of 9

22 Exhibit 99.5 EUV NXE Rudy 2014 SPIE lithography platform Peeters Advanced performance Lithography, overview San Jose CA,

23 Contents Roadmap NXE:3100 Summary Public Slide 2 and NXE:3300B acknowledgements

24 ASML Slide Extend Improved Imaging Increased 3 EUV NA / throughput Overlay lens 0.33 technology and to performance illuminator below higher roadmap 10nm performance dose match - extendibility node requirements Public

25 ASML s Public Slide NXE:3300B NA Illumination Dedicated Resist Dose 0.33 NXE:3100 Chuck Conventional shipments mj/cm2 Overlay and started 15 NXE:3300B / 0.8 mj/cm2 4.0 Conventional 2013 nm / 7.0 nm nm, 6 off-axis / 5.0 nm pupil Matched settings Machine Resolution Overlay 27 Productivity nm 22 nm 6-60 Wafers / hour Wafers / hour

26 Public Slide Contents Roadmap NXE:3100 NXE:3300B Summary 5 and acknowledgements

27 Accumulated Slide Public systems NXE: operational learning customers for wafers in of exposed on NXE: use cycles

28 NXE:3100 Public Slide Data courtesy 7 shows of imec stable EUVL performance Toyama 2013

29 Public Slide Contents Roadmap NXE:3300B Summary 8 NXE:3100 and acknowledgements

30 Public Slide Multiple 2 Install 64th EUV systems more generation (NXE:33x0B) cleanroom 9 has NXE:3300B exposing been started extension wafers systems for 3 is at status (NXE:3350B) systems being under the fully customer overview integrated construction qualified integration sites ongoing

31 Consistent Public Slide Delivered Lens Every NXE:3300B Data Based courtesy 10 bar Zeiss to and ASML NXE:3350B of reproducible individual input Carl and Zeiss does NXE:3350B lens SMT NXE:33x0B not GmbH include lens lens scanner performance contributions Lens NCE = Non Correctable Error

32 Public Slide Contents Roadmap NXE:3300B Summary 11 NXE:3100 and acknowledgements OVERLAY

33 Overlay Public Slide wafer <1nm 12 load clamp improvements grid flatness reticle lens clamp implemented performance on NXE:3300B flatness

34 Full Public Slide Filtered 8 Y Chuck 4 Overlay 299.7% 51 Day Layers Dedicated Lot nm 2 3 wafer y: 13 (1.3,1.3) x: [nm] are S2F 1.0 chuck dedicated exposed nm Chuck nm 1.4 X 01.4 overlay 1.3 on 1 chuck (S2F) the is same overlay measure wafer of of <1.4nm on the overlay same chuck performance over multiple of the days system

35 Good Slide [nm] 2.5 Overlay Matched Intrinsic 01 Systems See 2 Reticle 99.7% 3 Jan full Machine Mulkens X 2 design Wafer 1.5 wafer 10 Overlay clamping nm Grid clamping differences matched x: Y matching 3.45 nm machine 0.5 y: using 3.3 Projection nm overlay 1 different optics performance reticles on multiple systems (NXE:3300B to immersion) Public

36 Public Slide Contents Roadmap NXE:3300B Summary 15 NXE:3100 and acknowledgements DEFECTIVITY

37 The Public Challenging DUV Reflective Pellicle Transmitted illumination mask Reticles pattern multilayer Particle defect Reflected EUV challenge requirements Reticles (µm illumination size) (193nm) Reticle Particle reflective Absorber (13.5nm) (nm size) EUV mask without pellicle Slide 16

38 Current Slide Reticles The Particles Pre-measure test 17 per defectivity shows and added Reticle wafers reticle all during particles qualification pass Post-measure are reticle cycled test that handling under come test reticle for Load onto outside particles Particles reticle the front-side the Take scanner the reticle front of system the level side exposure Cycle of can are the reticle/wafers not conditions be tested excluded - for particles without reticle printability per during light reticle on therefore wafer pass complete level (PRP) executable reticle Public also cycle in (off-line into scanner measurements out of scanner / in-scanner integration cycling) phase

39 Slide [#] Multiple Measured PRP Particles Systems # 1 LOTs Wafers 0 pass 2100x level 23 [#] 0.04 NXE:3300B 345 at test 042 >92nm particles testing duration sensitivity for systems 144 is Particles ~ hours reticle 30 Per Reticle During Pass Total integration (PRP) # is phase done actions simulating are per production done on use the during system integration which can lead at ASML to variations Public in test result

40 New Slide Reticle/wafer Expose Uses Therefore, imaging a 19 location PRPi 32nm if a Expose Cycles PRPi line- particle based test Expose test PRPi analysis focuses generated 32nm pre and reticle on line-space provides printability cycle the system wafers information defectivity of it reticle post can be space reticle defects when determined defectivity a cycle on particle wafers when during reticle level and and the reticle where excludes exposures this particle outside gets onto has scanner been the front reticle generated side handling of the reticle Public

41 Public Slide Early Repeated No Extended added 20 NXE:3300B test build-up performed defects are on of test frontside a statistics combination results two systems from of ongoing the PRPi of System A reticle using test reticle a absorber are test promising reticle found defects during (not and a production simulated multilayer wafer reticle) defects, exposures System and particles Repeated already defects present (blue dots B on in the the reticle figures) during observed initial already exposure present during initial PRPi exposure

42 Progress Public EUV Reflective Pellicle Particle Reflected illumination See Carmen Reticles Slide (µm continues multilayer Zoldesi 21 First size) (13.5nm) prototype in Reticle EUV pellicle full Absorber size development free-standing pattern psi pellicle in progress

43 Public Slide Contents Roadmap NXE:3300B Summary 22 NXE:3100 and acknowledgements PRODUCTIVITY

44 MOPA Vessel Key High Optics Controllers Beam control Master See David factors input Transport Public Oscillator PA Prepulse Brandt CO2 optics for Dose high laser System Source Power optic source and power optic Architecture Prepulse Amplifier Master power Generator optic requires are: Oscillator optic Sub-Fab With and PA seed Metrology Floor Collector, Power laser Amplifier trigger High Droplet conversion Slide 23 efficiency (CO2 to EUV energy) High collection efficiency (reflectivity and lifetime) Advanced controls Focusing

45 Technology Public [W] 68 Plasma 66 Controls Dose Data 73 Power taken margin 72 and that on 70 gas-dynamic Demonstration: >3.5x is compensate MOPA 69 the difference reduced Prepulse forces using 70W all between development distort forces power advanced unstabilized droplet enable using dose source closed trajectories MOPA+PP control open loop loop Slide 0 causing 1 2 power and 6 energy operation stabilized instability with closed reduced loop dose power margin Time [min]

46 Industrialization: Public [%] 32 [W] 31 Power Dose EUV Repro Time 30W Results NXE:3300B Calculated [%] 10 [%] 60 (Exposures) 100 dose Dose [sec] % 30 shown 70 time D controlled Dose 0.5 Repro ies MOPA+PP sources 0200 [sec] using Good 40 Repro Power 30W % Time ~18kW in 30 power, 300 EUV the [%] Repro source time 350 field power with drive [sec] 0 Repro operated have % laser on [sec] ~22kW ies a power die 150 production in (Exposures) Dose automated yield 200 drive Repro 250 (percentage laser source [%] mode power 350 Slide simulated -2 capability dies meeting the 0.5% dose repro specification)

47 Industrialization: 100 (exposures) Error 0 Dose 4% -2 Dedicated 99.9% Stable Calculated Dies % source die Max yield test stability 60 0 operation: Dose run:xe:3300b Error 99.9% (percentage Stable test Error 80 run, 0.5% source Automation, [%] slightly simulated Error MOPA+PP operation different start-up dies is source meeting key settings routines, Public operating the and recovery 0.5% power in dose automated as routines, repro on previous specification) mode diagnostics for slide 6hrs and Slide closed 26 continuously loop controls within in x, y, dose z, t spec. and E Fully automated for Fab operations

48 In-situ Significant Slide Reflectivity Measurements Full collector 27 Collector improvement after in-situ on Cleaning: cleaning different cleaning to compared Technology reflectometers COO capability and Availability as Proven demonstrated and new sample Public locations with NXE:3300B compatible configuration

49 Public Slide Contents Roadmap NXE:3300B Summary 28 NXE:3100 and acknowledgements FOCUS & IMAGING

50 NXE:3300B Public Slide 25 [nm] 10.4nm 15 Uniformity 0 The System 2 3 focus is # 11.5nm done uniformity Focus 10 full Focus in 8.1nm wafer resist sensitive 5 performance 9.6nm focus marks uniformity are test being <12nm exposed to obtain full wafer coverage information

51 3-day Public Slide 10 6 (nm) Focus Chuck Mean Wafer 1 Day Focus Stability: 01 Day 42 Chuck 5 Per 3-day 61 Stability Day wafer 2 Focus 3 16 of 3-day Stability fields 2.4nm Mean are on of exposed NXE:3300B Focus 2.4nm range over both 2 chucks

52 Multiple dense Slide System 22 Full CD nm measurements wafer 31 and DL IL A systems System iso CDU lines <1.2nm show B 1.6nm performed exposed System NXE:3300B at C with 16mJ/cm2 System YieldStar CDU D Public below 1.6nm

53 22nm Public Slide Conventional No post 32 dense processing and illumination iso done L/S with BE an = exposure 16 mj/cm2 latitude LWR of = 3.8nm 3.4nm >14% Exposure Latitude > 14% DoF > 100nm

54 24nm Public Slide Process Exposure Systematic Yieldstar 33 regular Window measurements latitude fingerprints contact Full 18% holes wafer Full dominated (~18nm wafer CD uniformity CDU: by node reticle 1.2nm DRAM) and 3 process DoF with > conventional 120nm illumination Large process window and 1.2nm FWCDU

55 NXE:3300B Public Slide 2 System Data Per improvement [nm] system Horizontal shown H intrafield 88 with [nm] proximity System possible nm respect CD 24 delta L/S with matching - H to measured -1.5 System 0 optimized average 66 delta Vertical 88 performance through over CD - illumination V 22nm Pitch -0.5 System 4 NXE:3300B s pitch CD [nm] L/S 24 on Pitch V population [nm] Average average intrafield multiple CD per fields pitch on is the then wafer compared with the to same test Target performance for 22nm L/S is +/- 0.7nm conditions (mask, resist, test layout) Further

56 The Slide 10 (%) 20 Flexibel Simulations See 20 Xiaofeng 8 NXE latitude 60 and platform 80 by programmable Liu Tachyon Exposure offers 140 SMO new 4 illumination concept NXE off-axis setting illumination Depth of focus to enhance (nm) mechanism process window using fly s Public eye integrator

57 (dipole-90 Slide 14 16nm EL 42 0 Focus (%) Dipole nm 36 dense H [nm] 60 dense 90Y setting) 80 L/S 50 lines 100 lines 25 with 0120 Public -25 >10% DoF -50 (nm) exposure latitude on NXE:3300B

58 Good Slide Tip-to-tip [nm] T2T Conv. 60 Conventional 50 [nm] 31nm 27nm logic 19nm 16 31nm T2L Quasar gap Tip-to-line CD tip-to-tip 20 27nm nm 5514 CD Quasar 45 Conventional and tip-to-line Conv nm 24 performance Dose 19nm [mj/cm2] Quasar at low Dose doses [mj/cm2] Public

59 EUV shrink Slide 27nm Tip 19nm Line/Spaces 16nm Logic to single-exposure 38 Node Tip possible Actual beyond Requirements enables 10nm Logic aggressive per node shrink requirement on 2D Public logic

60 Random NXE:3300B Public Slide -80nm EUV Node: DoF 20nm Position -12mm 60nm Good focus 120nm 39 print 40nm Logic 0mm logic the performance enables 10nm +12mm metal exposure -60nm layer single slit over user Single exposure the case full Exposure with exposure large -40nm slit DoF Conventional 80nm illumination -20nm

61 EUV 45nm Slide Dose 2013 ~45mJ/cm2 single 40 pitch, Low dose exposure Conv. resist Dose 45nm 10nm focus ~20mJ/cm2 pitch, Logic Conventional Conv. metal Public layer setting Feb DOF of 60-80nm

62 EUV 45nm Slide Dose Low Tachyon DOF dose of ~20mJ/cm2 single 41 pitch, 100nm NXE resist exposure Conv. OPC+ Dose 45nm focus 10nm ~20mJ/cm2 pitch, Conventional Logic Conv. metal Public layer setting

63 EUV 45nm Slide Dose Low NXE Quasar DOF dose 120nm ~20mJ/cm2 single 42 OPC+ pitch, 45 resist setting exposure Conv. Dose 45nm 10nm ~20mJ/cm2 pitch, Logic Q45 metal Public layer

64 Excellent Low 45nm Slide Dose > factor dose, ~45mJ/cm2 43 pitch, 2 process dose off Q45 axis focus Public window Dose illumination, reduction ~20mJ/cm2 45nm for 10nm pitch, NXE Logic Conv. OPC+ metal layer

65 Public Slide Contents Roadmap Summary 44 NXE:3100 and acknowledgements NXE:3300B

66 Summary Public 27nm NXE:3100 NXE:3300B Multiple Performance Matched 70W Good Early Progress MOPA-PP results defectivity 19nm continues NXE:3300B machine Slide exposing of fit use new for source performance 45 overlay customer defectivity process EUV system wafers power (EUV pellicle development and qualified at shown demonstrated PRPi customer device immersion development test and multiple development sites 10nm showing with ) First performance Logic systems good good prototype at dose 70W customers imaging at ASML control source of full <4nm and promising power in shown integration overlay and results performance sub-20nm multiple phase size free-standing systems DRAM psi pellicle in progress

67 Acknowledgements Public Slide The Special work 46 thanks presented to our today, partners is the and result customers of hard for work allowing and dedication us to use some of teams of their at ASML, data in Cymer, this presentation Zeiss, and many technology partners worldwide including our customers

68 Extending Frank Feb 27th Bornebroek 2014, ArFi SPIE immersion Advanced scanner Lithography, capability San in support Jose of 1xnm production nodes Exhibit 99.6

69 Contents Lithography New Productivity Focus Imaging Overlay Future ArFi control developments technology requirements & introduced Summary & immersion in HVM roadmap

70 TWINSCAN including Litho On CD Total Node package NXT:1960Bi NXT:1970Ci Timing DCO Full Throughput Defects/Wafer * Full Product Uniformity installed / Focus Requirements extension MMO Q1 overlay Focus CDU 2013 Overlay (96 Budget to NXT:1970Ci ArFi 2.5 base 10 reference iso shots) 1H (iso) / Unif & <7 4.5*nm roadmap 1.8 to focus <7 2.0nm nm <7 1H requirements nm WpH 2.0* NXT supports 1.3nm 20nm 2014 / 250 Extensions *nm 1.4 2H 20nm 1.3nm future WpH for 2.0* nm 1.0nm 250 multiple nodes 2016 / WpH 3.5*nm patterning nm <1.5* WpH / <2.5*nm

71 NXT:1960Bi Up 6000 Best 4000 Wafers 3000 (actuals) Foundry (>50% systems to week > per 4000 DRAM utilization) 5000 Day 54 WpD installed systems Best NAND (>50% quarter show 39 base average, high utilization) systems productivity > with 5000 (>50% utilization WpD utilization) best > 50%, week max average per segment

72 NXT:1970Ci is in use in HVM

73 TWINSCAN to Wafer UV Process Parallel Improved Lens: Reduced Immersion Higher Legend: Overlay support Level Stage: throughput productivity independent lens Imaging/Focus non-correctable Lens sensor: down hood: interferometer: NXT:1970Ci heating to Tighter 10 leveling nm & Productivity errors node Reticle focus design requirements Improved & heating improvements overlay edge control Matching Improved focus control thermal stability

74 New in > NXT:1970Ci March day use 21 NXT:1970Ci (max) for day 2014 Logic, (max) system day 2500 MPU, 3 systems day ramping 2000 NAND 4 day 1500 to field to 5- HVM & 4500 day 1000 DRAM by productivity 15- Q1 HVM applications at 5 memory systems in days chip already maker in use

75 TWINSCAN to Wafer UV Process Parallel Improved Lens: Reduced Immersion Higher Legend: Overlay support Level Stage: throughput productivity independent lens Imaging/Focus non-correctable Lens sensor: down hood: interferometer: NXT:1970Ci heating to Tighter 1x leveling nm & Productivity errors node Reticle focus design requirements Improved & heating improvements overlay edge control Matching Improved focus control thermal stability

76 250 with New NXT:1960Bi NXT:1970Ci 0.6 defects Immersion Resist scanner WpH robust wafer contact NXT:1970Ci stage immersion defects/ throughput systems angle & immersion wfr defect wafer (10wfr control throughput hood (customer average. support No wafer proven post-soak, 800mm/s stacks) scan Resist: speed AIM )

77 NXT:1970Ci at 1960Bi 40% Focus 75% MA high MA Z 40% productivity 0.7 X m/s Y wafer Overlay stage with 1970Ci consistent improved 0.8 performance dynamics m/s from centre-to-edge

78 consistent Focus Scanner 0 NXT:1970Ci Full Results 2 Focus 3 wafer 4 5 have contribution 6 Uniformity been shows systems all nm 9 systems [nm] corrected down only including & to center-to-edge for 10nm wafer Offset focus (table) &tilt uniformity per un-flatness field to illustrate & process Imaging contributions Optimizer capability

79 NXT:1970Ci NXT:1960Ci NXY:1970Ci wafer segmented multi-segment table wafer heater wafer table minimizes table heater heater fingerprints

80 TWINSCAN to Wafer UV Process Parallel Improved Lens: Reduced Immersion Higher Legend: Overlay support Level Stage: throughput productivity independent lens Imaging/Focus non-correctable Lens sensor: down hood: interferometer: NXT:1970Ci heating to Tighter 1x leveling nm & Productivity errors node Reticle focus design requirements Improved & heating improvements overlay edge control Matching Improved focus control thermal stability

81 Improved proven NXT:1950i/60Bi aberrations NXT:1970Ci Lens RMS Projection RMS at multiple NXT:1970Ci RMS (7 systems) [a.u.] RMS (>200 RMS projection Z5-Z37 systems) lens Spherical aberration Coma control Astigmatism 3-Foil

82 TWINSCAN to Wafer UV Process Parallel Improved Lens: Reduced Immersion Higher Legend: Overlay support Level Stage: throughput productivity independent lens Imaging/Focus non-correctable Lens sensor: down hood: interferometer: NXT:1970Ci heating to Tighter 1x leveling nm & Productivity errors node Reticle focus design requirements Improved & heating improvements overlay edge control Matching Improved focus control thermal stability

83 Parallel PARIS NXT:1960Bi NXT:1970Ci 1 Reticle 2x7 Lens Faster nm points correction & heating sensor Image more capture with allows accurate sensor residuals using PARIS actual for enables scanning measurement after accurate barrel sensor minimized correction lens shape higher element using (max order reticle Parallel over corrections heating 15 Lens wafers, Interferometer 50 mj/cm2) (PARIS)

84 Automatic Lens New And corrects ultra-fast multifunctional heating wafer-by-wafer causes it Paris with aberration field sensor distortion lens measures detects manipulator heating lens offsets lens corrections heating in between every wafer

85 NXT:1970Ci Lot-by-lot Overlay Wafer-by-wafer Machine wafers 1st layer: drift Overlay lot Annular feed mainly lens forward feed heating illumination due back to corrections low order low only reticle with result aberration Paris transmission in stable sensor drift through-lot (Z2/3) 2nd layer: overlay Dipole illumination high reticle transmission

86 TWINSCAN to Wafer UV Process Parallel Improved Lens: Reduced Immersion Higher Legend: Overlay support Level Stage: throughput productivity independent lens Imaging/Focus non-correctable Lens sensor: down hood: interferometer: NXT:1970Ci heating to Tighter 1x leveling nm & Productivity errors node Reticle focus design requirements Improved & heating improvements overlay edge control Matching Improved focus control thermal stability

87 More Previous 600 NAND -80 Reduced accurate New 200 Resist BARC SiO scaling) Example: Gate 0.07 nm NAND product level and 60 Contact intrafield _limit ~ edge process level 0.09 Z_ 1 smaller sensor µm -40 wafer roll-off [nm] sensor product dependency &(UV-LS) Note: 0.08 detection product 0 manual measurement 0.12 scaling) AGILE wafer spots sensitivity by Y effect [m] leveling 0.13 for (auto more airgauge _limit with 0.06 accurate 0.14 UV -20 sensor 0.14 [nm] -80 LS edge manual X is [m] used measurement (auto 0.06 calibrate scaling) Y [m] (auto -20

88 NXT:1970Ci LOGIC previous 600 UV Level 200 ~ 425 No 1 air µm nm Sensor gauge DRAM Level sensor UV Sensor NAND Level based Sensor intra-field works fingerprint for all applications compensation applied

89 NXT:1970Ci system Imaging performance

90 NXT:1970Ci 40nm Horizontal isolated dense Vertical lines full shows stable wafer CDU through lot

91 NXT:1970Ci system Overlay performance

92 to NXT:1960Bi NXT:1970Ci 0.90/0.79 >25% 0.65/0.56 (99.7% For stable matching seamless consistent without well HVM & overlay below of productivity robust integration to nm usability all performance ArFi data) design 1 improvement overlay nm WpH & chip EUV with shows compromise for (heating, manufacturers holistic & multiple improved 800mm/s 700mm/s lot lithography scanners settings) machine (2014) (SPIE need 2013) overlay

93 NXT:1970Ci resulting Paris Multi-segment 5.0 ( st Reticle Dense 2nd Layer Wafer Cuts/Via s NA wafer Lot 2 Machine 3 Lot = 4 in-line nm, 1.35, heating Lines 5 11 Lot nm) 717 Mode Sigma <2 Lot lens reticle 8 overlay minimizes 18 Varying 9 wafer Lens 10 = = machine Annular / /0.79 heating [nm] Quasar table lot sizes heating 5 correction overlay 6 Transmission: 1 and 1 2 correction 17 through 3 lot 418 transition lot ~40% ~80% effects

94 consistently Matched (ArFi Wafers Results NXT:1970Ci nm to have ArFi) machine nm for been shows systems supports all overlay corrected systems <2.5 correction nm for matched higher of higher overlay order order wafer capability wafer & field & field fingerprints by holistic lithography

95 NXT:1970Ci overlay 1st Matched X: Y: 2nd YieldStar layer nm matching NXE:3300 Overlay NXT:1970Ci overlay ArFi EUV at metrology supports 2.6nm to ArFi demonstrated EUV insertion

96 Future developments

97 Future Several Alignment Wafer Reticle Further Lens Improved Grid Reduction calibration stage reticle robustness focus temperature of & grid heating wafer performance improvements calibration Improved table areas will improvements control be under driven errors Improved Reduced accuracy investigation by Overlay non-correctable temperature & Focus control errors control

98 Summary

99 TWINSCAN NXT:1960Bi 250 New Reduced Intrinsic Matched Overlay WpH NXT:1970Ci parallel matching machine process overlay wafer image systems throughput effects to overlay to ramping ArFi sensor EUV at chipmakers & supports capability as at minimizes accurate to at low 2.6nm HVM 800mm/s as overlay < nm demonstrated edge show productivity lens with detection up & focus shown reticle robust to > 5000 requirements by heating immersion UV all WpD systems Level effects productivity defect for Sensor 1x control nm nodes at high productivity

100 Padyi, Acknowledgements Janneke Afra de Birgitt Graaf van Heteren, Hepp,, Nico to: Shufen Vanroose, Joost Smits, Tsoi, Marjan Jeffry Martijn Hoofman, Goossens, Leenders, Roelof Ron Igor Schuurhuis, de Bouchoms, Graaf, Haico Richard Wim Kok, de Pongers, Boeij, Matthew Jan Pieter Jaap McLaren Gunter, Kuit, Remi Ruben Pieternella, Snijdewind, Toine Mustafa de Kort, Cem Peter Unver, Schrap, Paul Jeroen Teunissen, Bominaar, Thomas Siebe Voss, Landheer, Bart Smeets, Mayke Oksana van der Gnatiuk, Ploeg, Dion Alexander George,